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Metrology - Applicable anywhere, impressive everywhere
Metrology - applicable anywhere, impressive everywhereWhether in the geodesy, photogrammetry, laser tracking, scanning or the quality assurance: The
optical measuring systems of Berliner Glas convince in the optical
metrology through flexibility and precision. Therefore there is no
object too big, too small or too complex to not to be measured. - Optical systems for measuring building facades or airplanes
- Optical systems to image three-dimensionally, the earth´s surface
- Optical systems for innovative and laser-based metrology
Engineering
Key components*
Material: optical glass, CaF2, MgF2, quartz, glassceramics, ceramic, borosilicate glass und filter glass Spherical lensesDimensions
| up to Ø 500 mm | | Radii | 1.2 mm upwards (without limit)
| Centering error
| 10" | Fitting error
| λ/40 PV, measured at 632.8 nm | Surface error
| 5/1 x 0.025
| Micro roughness
| 2 Å rms
| Average thickness tolerance
| +/- 3 µm | Diameter tolerance
| +/- 3 µm
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Aspherical lenses
Dimensions
| Ø 5 - 150 mm | Fitting error
| λ/20 PV, convex und concave, direct interferometric measurement
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Cylindrical lenses
Radii
| 2 - 50,000 mm | | Length | up to 500 mm, larger on request
| Lens width
| up to 300 mm (depending on the focal length) | Fitting error
| λ/8 PV, measured at 632.8 nm | Surface error
| 5/1 x 0.025 | Micro roughness
| 2 Å rms | Centering
| Rotation: 10", offset: 4 µm, wedge: 3µm |
Windows, prisms and prism systems Dimensions
| up to max. 1,500 mm | Flatness
| λ/40 PV, measured at 632.8 nm | | Parallelism | 1" | Angular accuracy
| 1" | Micr roughness
| 2 Å rms
| Surface defects
| 5/1 x 0.004 |
- Reticules, masks, coded and analog circles
- Structured coatings
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| Beam splitter/combiner (cemented/uncemented) | |
Assemblies Systems
- Optical assemblies and systems (cemented beam splitter, prim systems, doublets, triplets, step systems)
- Optomechanical assemblies and systems
- Elektro-optical systems
- Lens systems
- Objectives, zoom systems
- Measuring systems
- Cameras
- Laser systems
- Light sources
- Lighting systems
| Wavefront | Interferometer (4 - 24"), Shack-Hartmann wavefront sensor (UV, DUV, VIS, NIR) | Form deviation
| 3D coordinate measuring devices, calliper, CCD micrometers, Stitching interferometer | Angle precision
| Goniometer, interferometer, autocollimators | | Transmission/reflection | Spektral photometer | Surface defects
| Traveling microscopes
| Micro roughness
| White light interferometer, atomic force microscope | Imaging performance/resolution
| Computer-supported MTF-measurement, microscopic image resolution
| | Centering | Objective metrology system, laser centering station | Additional functional measurement
| Assembly-specific metrology station
| Fine correcting procedure
| Ionic beam process, robotic polishing, magnetorheological process
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*The following error and tolerance data indicates possible limit values. Specified and assessed according to ISO/MIL/DIN.
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